The world’s most finest pattern writing lithography system
The planar fabrication process which combines lithography with additive and subtractive materials processing helped to revolutionized electronic manufacturing industry. Through planar fabrication miniaturization in production of smaller electronic components was realized resulting in development of lithography.
The direct-write electron beam lithography is a patterning technique which has been evolving over the last 40 years. For many years it has been possible to use electrons to pattern lines with narrow widths and recent advancements in resist materials, electron sources, and system integration have fueled the further improvement in its capabilities. High-sensitivity resists provide substantial increases in the throughput without sacrificing resolution. Thermal field-emission sources improve the stability and reduce the minimum attainable spot size. Modern lithography systems integrate the electron beam column with advanced control electronics, making a system capable of?nanometer-scale placement accuracy. One of such advancement in this field is offered by a Japanese company by the name of ELIONIX offering an Ultra-High Precision Electron Beam Lithography System. The ELS-7000 is a state of the art lithography system featuring the capability of pattern writing of 5 nm lines with the acceleration voltage of 100 kV. The ELS-7000 features a beam positioning resolution on 0.31 nm with 18 bit DAC plus the laser interferometer with a resolution of 0.6 nm providing 30 nm stitching and overlay accuracy resulting in fine pattern lithography in large area. Further to this, the ELS-7000 comes with variable field size adjustment function, enabling the fabrication of WDM gratings.