Development of new Nanoscale Doping Technique Capable of achieving World’s Highest Performance Nanodielectic
Group of researchers at at National Institute for Materials Sciences (NIMS) led by Dr. Minoru Osada and Dr. Takayoshi Sasaki of the International Center for Materials Nanoarchitectonics (MANA) has successfully developed a new doping technique capable of fine tuning of chemical composition and structure in oxide nanocrystals. Through this method the researchers have produced a tailor-made nanocrystal through use of controlled nanoscale doping.
The dielectric nanofilms developed using this method displayed world’s highest performance. The new method can be used in designing nanodielectrics which are ideal for next generation capacitors and memory devices.