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	<title>Japan Technology Information &#187; chemical Vapor Deposition</title>
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		<title>Development of Technology in making Graphene transistors at low temperature on large scale substrates by Fujitsu</title>
		<link>http://japantechniche.com/2009/11/27/development-of-technology-in-making-graphene-transistors-at-low-temperature-on-large-scale-substrates-by-fujitsu/</link>
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		<pubDate>Fri, 27 Nov 2009 15:18:46 +0000</pubDate>
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				<category><![CDATA[Trendy Products]]></category>
		<category><![CDATA[chemical Vapor Deposition]]></category>
		<category><![CDATA[CVD]]></category>
		<category><![CDATA[Development of Technology]]></category>
		<category><![CDATA[Fujitsu]]></category>
		<category><![CDATA[Graphene transistors]]></category>
		<category><![CDATA[low voltage transistor]]></category>
		<category><![CDATA[miniaturization technology]]></category>

		<guid isPermaLink="false">http://japantechniche.com/?p=3909</guid>
		<description><![CDATA[As miniaturization technology is approaching its limit plus achieving further higher performance is increasingly becoming more difficult, forcing component manufacturers to seek alternative materials to currently used silicon such as transistor channels, the conduits that pass electricity in LSIs. One such material is Graphene a nano-scale carbon material which is essentially a single layer of [...]]]></description>
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