Development of Focused Ion Beam System using Nanometer Order Diameter Ion Beam
SII Nano Technology (SIINT) has announced the release of SMI4050 Focused Ion Beam system. Focused Ion Beam system (FIB) is the system that is used for etching, depositing and observation in a single system using the nanometer order diameter ion beam. Through this ability FBI is capable of circuit modification of semiconductor devices, the defective characterization, the cross sectioning and observation, the TEM sample preparation, metal grain observation, and others, contributing in development and improvement of electric components, advanced functional materials such as semiconductor. Read more
Release of Compact Etcher for Research and Development in Electronic Industry
ULVAC has announced the release of a compact etcher system for research and development in electronics industries. The new CE-L system comes with five-tier atmospheric cassettes modules allowing automatic processing of multiple pre-set trays, single wafer atmospheric transfer, as well as vacuum transfer. Read more
