The world’s most finest pattern writing lithography system
The planar fabrication process which combines lithography with additive and subtractive materials processing helped to revolutionized electronic manufacturing industry. Through planar fabrication miniaturization in production of smaller electronic components was realized resulting in development of lithography.
The direct-write electron beam lithography is a patterning technique which has been evolving over the last 40 years. For many years it has been possible to use electrons to pattern lines with narrow widths and recent advancements in resist materials, electron sources, and system integration have fueled the further improvement in its capabilities. High-sensitivity resists provide substantial increases in the throughput without sacrificing resolution. Thermal field-emission sources improve the stability and reduce the minimum attainable spot size. Read more
Development of new inkjet technology for OLED display fabrication process by Seiko Epson
OLED televisions are considered as the next generation of display but in spite of their outstanding viewing characteristics such as high contrast, wide viewing angle, fast response time plus their light weight, ultra-thinness and low power consumption, the mass production of large screen OLED TVs has been hampered by lack of a technology capable of reliably forming uniform organic layers on large substrates limiting their application to small screen Laptop PCs and mobile phone screens as well other mobile devices with screen. Up to now, the method for depositing organic materials has been Vacuum thermal evaporation (VTE), but this method has an inherent technical difficulty in overcoming layer uniformity issue making it difficult to start a mass production of large OLED panels. Read more
