Development of New Technology for Virtuagram® with Twice the Luminance by DNP

February 22, 2011 · Filed Under Trendy Products · Comments Off on Development of New Technology for Virtuagram® with Twice the Luminance by DNP 

DNP has developed a new technology for Virtuagram, with twice the luminance over the conventional products, ideal for anti-counterfeiting of passports and other ID documents requiring quick and simple authentication. The Virtuagram is a hologram made by using 3-dimensional computer graphics (CG). In conventional Hologram technology, where the holograms are place onto such document as passport tend to reduce their luminance due to roughness of the paper surface. But DNP’s new technology for Virtuagram modifies the relief patterns on the hologram master helping it to increase its reflectance by combining the latest CG technologies with high-definition electron beam lithography, increasing the luminance of the hologram by two fold in comparison to hologram manufactured using conventional CG technologies. High-resolution 3D images provide a first confirmation step for authenticity, followed by other authenticity measures that include printing a layer of materials with specific optical properties over hologram, allowing user to view the material with special viewer. Read more

Development of a High Resolution Photo-Sensetive film for EUV lithography by TOSHIBA

November 21, 2009 · Filed Under Trendy Products · 1 Comment 

With advancement of semiconductor technology as well as increase in wiring density use of the conventional polymer photoresists which is the base materials for conventional semiconductor resist will face some difficulties. With current scaling down of circuit pattern at the 20nm-scale generation the present photoresits will not be capable of resolving circuit patterns precisely resulting in roughness in pattern sidewalls, this is mostly due to the fact that the conventional photoresists consists of polymer compounds. Although, such compounds are easier to spin-cast on wafers, the size of their molecules and entangling of their molecular chains limit resolution. In response to overcome this issue, Toshiba has developed a photoresists with smaller molecular compounds for EUV (Extreme UltraViolet) generation by using derivative of truxene, a low molecular material with a finer and more durable characteristic than currently used polymer materials. Read more

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