Development of World’s First 2-gigabit DRAM based on High-K Metal Gate Technology
Elpida Memory has announced the development of industry’s first DRAM based on high-k metal gate (HKMG) technology. The new DRAM is a 2-gigabit DDR2 Mobile RAM (LPDDR2) at the 40nm-class. HKMG is a technology that was developed to reduce current leakage and improving transistor performance. The technology uses insulator film with a high dielectric constant in the transistor gate. In addition to this, metal gate electrodes which are required in high-k dielectric process are used. Read more
Development of Ultra-Small 4 Gigabit DDR2 Mobile RAM by Elpida
Elpida Memory has announced the development of a new ultra small 4-gigabit DDR2 Mobile RAM operating at 1.2V and 1066Mbps based on 30nm process technology. The new memory chip consumes roughly 30% less operating current in comparison to stacking two of Elpida’s 40nm 2-gigabit products. Achieving industry’s smallest class in chip size for a 4-gigabit LPDDR2, this newly developed eco-friendly memory chip is equipped with a low power feature ideal for mobile devices such as smartphones and tablet PCs by helping to extend operating times of these battery powered devices. Read more
